Thin film analysis
X-ray diffraction is especially valuable to the study of epitaxial layers and other thin film materials. Using precision lattice parameter measurement methods, the lattice mis-match of an epitaxial layer and its substrate can be determined with great precision. This lattice parameter match or mismatch is an important factor in epitaxial devices such as magnetic garnet films for bubble memories, doped gallium arsenide films for LED and high-speed transistors, infra-red detectors and other important electronic products. Another interesting use of XRD for thin films is that the coefficient of thermal expansion can be determined by plotting lattice parameters versus temperature using a high temperature diffractometer.
Systems
- Rocking curve: SmartLab®, Ultima IV
- Reciprocal space map measurement: SmartLab, Ultima IV
- Film thickness measurement, roughness, density: SmartLab, Ultima IV
- Reflectivity measurement: SmartLab, Ultima IV
- In-plane crystal structure evaluation: SmartLab, Ultima IV
- In-plane diffraction: SmartLab, Ultima IV
- Phase analysis, preferred orientation, distortion, residual stress: SmartLab, Ultima IV
- Pole figure, thin film diffraction: SmartLab, Ultima IV
- Mixed crystal composition ratio, lattice distortion: SmartLab
- Epitaxial layer thickness: SmartLab
- Superlattice periodicity structure evaluation: SmartLab
- Laboratory XRR: SmartLab, Ultima IV
- High-power θ/θ goniometer system: TTRAX III
- High-throughput XRF/XRD/XRR tool for patterned wafers: MFM65
- In-fab XRF wafer metrology tool: WaferX 300