Max-Flux^®

Figured and laterally graded multilayer X-ray optics, the Max-Flux line features a design wherein the d-spacing of the multilayer is varied across the surface of an aspherically curved optic. Bragg's law is therefore satisfied at every point along the optic, allowing a much larger collection angle (of a divergent X-ray source's multiple angles of incidence) to be utilized for a significant improvement in total flux.

The resulting beam maybe be collimated or focused by figuring the optic with a respective parabolic or elliptical surface. An additional benefit of the Max-Flux optical design is that the output X-ray beam is monochromatic. Customized versions are also available for your specific application and instrumentation.

Features

• Increases X-ray flux
• Reduces background; suppresses K_β by 40+
• Lowers beam divergence
• Reduces sample displacement errors
• Enables testing of irregularly shaped samples
• Eliminates angular and absorption effects
• Available for Cu, Mo, Cr, Co, Ti, and W-L