MFM65 in-line X-ray metal film monitor
Rigaku's new MFM65 in-line X-ray metal film monitor is designed for high-throughput, product-wafer measurements.Combining X-ray diffraction (XRD), X-ray fluorescence (XRF), and X-ray reflectometry (XRR) technologies on a single platform, MFM65 measurement capabilities include:
- Composition (XRF)
- Film thickness (XRR, XRF)
- Film density (XRR)
- Film roughness (XRR)
- Post-CMP dishing/erosion (XRF)
- Cross-wafer uniformity (XRF)
- Phase identification (XRD)
- Crystallinity determination (XRD)
- Texture (XRD)
Features
- Micro-spot X-ray beams and pattern recognition
- High-throughput, product-wafer measurements
- Wide range of materials and applications
- High resolution and precision covering thicknesses from Ångstroms to microns
- For 200 mm and 300 mm wafers
- Available with 300 mm factory automation
- Design based on SEMI S2 and SEMI S8